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0102030405

Nitrogen Trifluoride NF3 Electronic Gas

Specificatio:

CAS No.: 7783-54-2

EINECS No.:232-007-1

UN No.:UN 2451

DOT Classis: 2.2&5.1

Puritas: 99.99%-99.999%

Standard Packaging: 40L cylindrici/47L cylindrici/440L cylindrici

Molecular pondus: 71.0019 g/mol

Densitas: 2.96 kg/m³

Chemical Property: Non flammabilia Gas, Oxidizing Agens

Latin Grade: Industrial Grade, Electronic Grade

Nobis loquere

Product Details

depictio producti

NITROGENIUM Trifluoride compositum est inorganicum, formula chemica NF3, gasi hyalinae in temperatura et pressione normali, insolubilis in aqua, est agens validum oxidizing, est optimum plasma etching gas in microelectronics industriae, ac etiam ut summus industria adhiberi potest. cibus.

Specification

Specification	99.99%	99.999%
Carbon Tetrafluoride	≤40ppmv	≤20ppmv
Nitrogen	≤10ppmv	≤50ppmv
Oxygeni+Argon	≤5ppmv	≤3ppmv
Carbo carbonis monoxide	≤1ppmv	≤1ppmv
Carbon Dioxide	≤3ppmv	≤0.5ppmv
Oxideum nitrum	≤3ppmv	≤1ppmv
Sulphur Hexafluoride	≤3ppmv	≤2ppmv
umor	≤1ppmv	≤1ppmv
Express ut HF *	≤1ppmv	≤1ppmv

Typicam Applicationem

Ut oxidantus: Potest adhiberi ut oxidant pro hydrogenio fluoride lasers.

Ut an etching agens: Procurator adhiberi potest ut engraving in productione semiconductorum, crystallorum liquidarum et membranarum tenuis cinematographicorum solarium.

Sarcina & Shipping

Productum	Nitrogen Trifluoride NF3
Packaging Location	40Ltr Cylindri
Implens Net pondus / Cyl	20kgs
QTY Loaded in 20'Container	240 Cyls
Totalis pondus Net	4.8 Tons
Cylindrus Tare pondus	52kgs
Valvae	CGA330/DISS640