Ngwaahịa

Ụdị ngwaahịa

Ngwaahịa egosipụtara

Ngwakọta 20% Ethylene oxide / 80% Carbon dioxide

Silane na Nitrogen Mixture Gases

Ngwakọta Gases Calibration Gases Standard Gases

0102030405

Nitrogen Trifluoride NF3 Gas Eletrọnịkị

Nkọwapụta:

Nọmba CAS: 7783-54-2

EINECS Nọmba: 232-007-1

UN Nọmba: UN 2451

Klas DOT: 2.2&5.1

ịdị ọcha: 99.99% -99.999%

Nkwakọ ngwaahịa ọkọlọtọ: 40L cylinders / 47L cylinders / 440L cylinders

Ibu ibu: 71.0019 g/mol

Njupụta: 2.96 kg/m³

Ngwongwo kemịkalụ: Gas anaghị ere ọkụ, onye na-ahụ maka ikuku

Ọkọlọtọ Ọkọlọtọ: Ọkwa ụlọ ọrụ, ọkwa eletrọnịkị

Kpọtụrụ anyị

nkọwa ngwaahịa

Nkọwa ngwaahịa

Nitrogen Trifluoride bụ ogige inorganic, usoro kemịkalụ NF3, gas na-enweghị ụcha na okpomọkụ na nrụgide nkịtị, nke a na-apụghị ịsacha n'ime mmiri, bụ ihe na-emepụta oxidizing siri ike, bụ ezigbo plasma etching gas na ụlọ ọrụ microelectronics, a pụkwara iji ya mee ihe dị ka ike dị elu. mmanụ ụgbọala.

Nkọwapụta

Nkọwapụta	99.99%	99.999%
Carbon tetrafluoride	≤40ppmv	≤20ppmv
Nitrogen	≤10ppmv	≤50ppmv
Oxygen + argon	≤5ppmv	≤3ppmv
Carbon Monoxide	≤1ppmv	≤1ppmv
Carbon dioxide	≤3ppmv	≤0.5ppmv
Nitrous oxide	≤3ppmv	≤1ppmv
Sulfur Hexafluoride	≤3ppmv	≤2ppmv
Mmiri	≤1ppmv	≤1ppmv
Kwupụta dị ka HF	≤1ppmv	≤1ppmv

Ngwa a na-ahụkarị

① Dị ka oxidant: Enwere ike iji ya dị ka oxidant maka lasers hydrogen fluoride.

② Dị ka onye na-ahụ maka etching: Enwere ike iji ya dị ka onye na-emepụta ihe na-emepụta semiconductor, kristal mmiri mmiri na ihe nkiri dị nro nke anyanwụ.

Ngwugwu & Mbupu

Ngwaahịa	Nitrogen Trifluoride NF3
Nkwakọ ngwaahịa	40 lita cylinder
Na-ejuputa Net arọ/Cyl	20kg
Ebuuru QTY n'ime akpa 20'	240 Cyl
Mkpokọta arọ Netwọk	4.8 tọn
Cylinder Tare arọ	52kg
Valve	CGA330/DISS640